Silicon Nitride Strip
Silicon nitride is a commonly used film in semiconductor manufacturing. Complete removal is necessary prior to further processing. Hot Phosphoric acide has good nitride:oxide selectivity. Maintaining a clean bath through filtering is critical for successful cleaning.
Hot phosphoric nitride strip is performed at 180 degree C, done in a quartz bath. Temperature maintenance and etch rate are controlled by DI water spiking.
MEI offers outstanding Process control through temperature and water concentration maintenance, via our proprietary IDX Automation software.
MEI’s designed in safety and reliability allow us to deliver you a nitride strip solution that meets your production process needs.