DATA: Revolution Wet Processing System BrochureSemiconductor Wet Processing Full-Auto

 APPLICATIONS: Etch, Strip, Cleaning, and MLO Wet Bench with Minimal Fab Footprint


Rotary, Dry-to-Dry, Multi-Step, Multi-Tank, Small Footprint Solution

wet bench, semiconductor, wafer


MEI’s Revolution is an automated, multi-step, Rotary wet bench system. With IDX Flexware Control, an integrated rotary robot and a custom process tank configuration MEI creates powerful, flexible solutions and equipment that require minimal footprint. SECS/GEM compliant IDX Flexware Process Control software provides outstanding control and flexibility, custom tailored to your process solution. Our new, robust rotary robots can handle carriers up to 300mm wafers through multiple process steps and recipe configurations. Configurability, up-time, yield, maintainability and throughput are the hallmarks of an MEI wet processing system.



 NEW!  Dry-to-Dry with Integrated GenesisX Dryer

The Revolution is the most appropriate format for bay and chase fabs, and it provides a lower cost solution for process sequences of three to five tanks. MEI can link up to three robots in a given rotary platform, with a shell design customized to fit cleanroom space requirements.  The Revolution wet processing system  is well designed for maintenance,  with easy access bays for plumbing in the back.

 System Features:

  • Multiple Applications
  • Models for Acid & Solvent processes
  • Multi-Step processing
  • 150mm, 200mm, and 300mm wafers
  • 2-5 process tanks
  • Intuitive Graphical Interface
  • IDX Flexware Process Control software
  • SECS/GEM Compliant
  • Semi S2/CE / NEC
  • High reliability and uptime
  • Low cost solution
  • Small footprint

Available Options:

  • Custom tank and process bath options
  • Megasonic and Ultrasonic baths
  • Chemical spiking
  • Recirculation filtration
  • Heater/Chiller
  • Integrated dryer options
  • 100mm to 300mm wafer sizes
  • Process cassette customer specified
  • HEPA filtration
  • Automatic bulk chemical system integration
  • SECS/GEM compliant
  • Automatic or manual doors
  • FM4910 (Halar, CPVC, PVDF) or polypropylene or stainless steel.
  • SEMI S2-0703 3rd party evaluation audits
  • FM certified systems
  • UL Listed 508A Panel Shop


All MEI’s platforms

  • Flexible and Upgradeable
  • Easy to Use and Well Controlled
  • Tailored
  • Production Ready
  • Designed for Safety
  • Maintenance Friendly
  • Reliable
  • Supported
  • More about our Features & Benefits and Design Process

Multiple Process Applications

  • CMP Clean5 tank Rotary Wet bench
  • Prediffusion Clean
  • Multiple Oxide Etch
  • Solvent  Strip
  • Developer
  • Sulfuric Resist Strip
  • Nitride Etch


IDX Flexware Process Control Software

MEI’s IDX Flexware Process Control software provides advanced monitoring and control features that are only found
on MEI platforms. IDX provides the required stability for critical process conditions through closed loop monitoring logging
all key process variables, conditions and configurations. The result is a uniquely tailored reliable process capable of consistent , repeatable results.IDX Flexware Control Software









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