DATA:
Evolution Wet Processing System Specifications  Semiconductor Wet Processing Full-Auto


APPLICATIONS:

Semiconductor, GaAs, solar cell, IC, Medical and MEMS


Evolution Wet Processing System

High Throughput, Modular, Dry to Dry, Multiple Lots, Multiple Recipes & Advanced Scheduler

The MEI Evolution series semiconductor and MEMs automated wet benches are in-line, configurable, automated, modular, linear batch immersion wet process systems made for high throughput at a low cost. They are designed for dry in and dry out batch wafer processing of multiple lots of wafers from 100mm to 300mm, with a Class 1 Environment. Custom configurations combine SECS/GEM interface capabilities, multi step processing, cascade or quick dump rinsing with optional chemical injections, maringoni drying and linear robotic transfer capabilities into a system that is tailored for your specific process needs.  Ultrasonic and Megasonic tanks and baths are available.

 

 

Highly configurable Modular Design

Wet bench

MEI’s Evolution Wet Bench Systems provide Full-Auto, Dry-to-Dry solutions, suitable for a wide variety of cleaning, etching and stripping applications, including all substrate types used in semiconductor, GaAs, solar cell, IC, Medical and MEMS device manufacturing as well as parts cleaning applications. The Evolution provides Customer-Spec configurations, high-performance throughput,  excellent up-time, and award-winning support. Being “Built on Commitment”  is the hallmark of every MEI wet processing system.

For production lines with multiple process steps and complex process sequences, the MEI Evolution Wet-Processing systems is a very space and cost-effective solution. The MEI Evolution provides a higher throughput, because it is capable to process multiple lots and multiple recipes simultaneously. The Evolution is ideal for processes with hot phosphoric baths and other “lidded” process tanks, as it allows for gravity spiking of multiple chemistries, and provides a fully enclosed environment with HEPA filtration.

Semiconductor Wet Bench

MEI’s Advanced Process controls provide the necessary stability and control of all process conditions through closed loop monitoring/control while logging all key process variables. The result is a reliable, repeatable system capable of advanced processes monitoring capabilities required for critical process steps.IDX Flexware, Automation Control Software

 

 

Evolution Automated Wet Processing System Options:

  • 150mm, 200mm wafers
  • SMIF and “open cassette” input options
  • Class 1 Environment
  • Ballroom and Bulkhead mounting
  • Heater, chiller, dryer options
  • Spiking, reclaim, lid, overflow weir, recirculation,
  • Filter, fill method, agitation, flush and drain options
  • Megasonic or ultrasonic baths, chemical spiking, recirculation and filtration
  • Heater (including solid state), chiller and dryer options
  • Wafer carrier and queue pass-on cassette options
  • HEPA filters to create a positive pressure environment
  • SECS/GEM Interface Options
  • Automatic bulk chemical system integration
  • Integrated chemical spiking
  • Automatic or manual doors
  • Choice of materials, FM4910 (Halar, CPVC, PVDF) or polypropylene or stainless steel
  • SEMI S2-0703 3rd party evaluation audits and FM certified systems
  • UL Listed 508A Panel Shop

All of MEI’s Wet Benches, Wet Stations and Wet Processing Equipment Are:

  • Flexible and Upgradeable
  • Easy to Use and Well Controlled
  • Tailored
  • Production Ready
  • Designed for Safety
  • Maintenance Friendly
  • Reliable
  • Supported
  • More about our Features & Benefits and Design Process

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